Traditional micro/nanofabrication methods, such as ultra-violet lithography (UV lithography), electron beam lithography (EBL) and focused ion beam (FIB) all have limitations and may not meet the demands for many scientific researches. For example, the process of UV lithography and EBL are complicated, especially for high precision and multilayer fabrication. FIB is not merely inefficient; it may also change the intrinsic properties of materials due to the high mass of gallium ion induced doping. Furthermore, the conventional fabrication processes are typically top-down methods, inevitably giving rise to burrs on pattern edges due to various causes. For fabrication tasks that require high precision, such as sub-20 nm processes, the size of burrs on the edges is comparable to the targeted patterns, making it barely possible for sub-20 nm fabrications using traditional technologies. This talk will introduce three unconventional fabrication techniques and their applications in scientific researches. (1) Operable wrinkles under the laser, electron beam and atomic force microscope (AFM); (2) Controllable cracks with straight sidewalls, sharp edges and aspect-ratio for sub-10 nm fabrication; (3) Emerging and promising fabrication technology— helium ion microscope (HIM).
Dr. Dongxue Chen received his PhD degree in Condensed Matter Physics from the National Center for Nanoscience and Technology in 2016, under the supervision of Prof. Qian Liu. He then worked as a postdoc with Prof. Kaihui Liu at Peking University, co-advised by Prof. Dapeng Yu (Member of the Chinese Academy of Science) at Southern University of Science and Technology. His research focused on nanophotonics and nanofabrications, and synthesis of two dimensional materials.